van Helden, Jean-Pierre

The Ar(³P₂) metastable density in the effluent of the cold atmospheric pressure plasma jet kINPen-sci was investigated as a function of the feed gas humidity, the gas curtain composition, and the distance from the nozzle by means of laser atomic absorption spectroscopy. The data set comprises the axial distributions of the Ar metastables as a function of these parameters.

The data set comprises the spatial distributions of H and O atoms in the cold atmospheric pressure plasma jet kINPen-sci. The data was obtained by means of picosecond two-photon absorption laser induced fluorescence spectroscopy (ps-TALIF) and numerical simulations.

The temporal behavior of the molecular etching product SiF4 in fluorocarbon-based plasmas used for the dry etching of ultra low-k (ULK) materials has been brought into connection with the polymer deposition on the surface during plasma treatment within the scope of this work. For this purpose, the density of SiF4 has been measured time-resolved using quantum cascade laser absorption spectroscopy (QCLAS).