The present invention relates to a plasma generating device which comprises an electrode carrier (5) and a first electrode (10) as well as a second electrode (20), the first electrode (10) being arranged on or in the electrode carrier (5). Furthermore, it comprises a high-voltage suitable plug contact connection (40) for making electrical contact with at least one of the electrodes (10, 20), the plug contact connection (40) having a plug (50) and a receiving socket (60) for receiving the plug (50) and the receiving socket (60) is fixedly arranged on or in the electrode carrier (5) and is electrically conductively connected to one of the electrodes (10, 20).
The invention also relates to a plasma generation system with several of the plasma generation devices according to the invention, as well as a method for generating plasma and a method for disinfecting surfaces.
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Figure 1 of the Patent Specification
EP3051926 B1
1. A plasma generating device (1), comprising an electrode carrier (5) and a first electrode (10) as well as a second electrode (20), wherein the first electrode (10) is arranged on or in the electrode carrier (5), and further comprising a high-voltage suitable plug contact connection (40) for electrically contacting at least one of the electrodes (10,20), wherein the plug contact connection (40) has a plug (50) as well as a receiving port (60) for receiving the plug (50) and the receiving port (60) is securely arranged on or in the electrode carrier (5) and is electroconductively connected to one of the electrodes (10,20), wherein the plug (50) has a plug shaft (51) and a recess (52) arranged therein, in which recess an engaging element (61) of the receiving port (60) is force- and/or form-fittingly engaged, wherein the plug (50) has a circumferential channel or groove on the plug shaft (51) which forms the recess (52), characterized in that the receiving port (60) has a spring element as an engaging element (61) which is resiliently pressed outward by the plug shaft (51) during insertion of the plug (50) into the receiving port (60) and which engages with the recess when overlapping with said recess.
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Plasma Source Specification |