INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

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Plasma generating device, plasma generating system and method of generating plasma

A device for generating plasma (1) comprises a high voltage electrode (10) as well as at least one external electrode (11, 12), wherein the high voltage electrode (10) at least in one coordinate direction (34) is arranged between conductive material of at least one external electrode (11, 12). The high voltage electrode (10) is covered with a dielectric (21) at least one side facing an external electrode (11, 12). Between the respective external electrode (11, 12) and the high voltage electrode (10) over its longitudinal extension at least one spacer element (20) is present, which at least in the region of its arrangement electrically insulates the respective external electrode (11,12) from the high voltage electrode (10) and which positions the respective external electrode (11, 12) at a constant distance from the high voltage electrode (10), wherein the spacer element is a gas-permeable foil.

Figures 1 and 2 of the Patent Specification

Main Patent Claims: 

EP3171676 B1

1. A plasma generating device (1) comprising a high-voltage electrode (10) as well as at least one external electrode (11, 12), wherein the high-voltage electrode (10) is, at least in one coordinate direction (34), arranged between conductive material of at least one external electrode (11, 12) and the high-voltage electrode (10) is covered with a dielectric (21) at least on one side facing an external electrode (11, 12) of the plasma generating device (1), and wherein between the respective external electrode (11, 12) and the high-voltage electrode (10) over its longitudinal extension at least one spacer element (20) is present, which at least in the region of its arrangement electrically insulates the respective external electrode (11, 12) from the high-voltage electrode (10) and which positions the respective external electrode (11, 12) at a constant distance from the high-voltage electrode (10), characterized in that the spacer element (20) is planar in design, and the spacer element (20) is a perforated and/or structured, gas-permeable foil made of an electrically non-conductive elastomer.

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
EPEP3171676B117.11.201524.06.2020granted (active in Germany, Finland , Norway, Sweden, Austria, Switzerland)
USUS10,307,606B216.11.201604.06.2019granted
Applicant(s)
Inventors
Device Info
FieldValue
Plasma Source Name
Plasma Source Application
Plasma Source Specification