INP

Leibniz Institute for Plasma Science and Technology
Felix-Hausdorff-Str. 2
17489 Greifswald
GERMANY

https://www.inp-greifswald.de/en/
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The Leibniz Institute for Plasma Science and Technology (INP) is the largest non-university institute in the field of low temperature plasmas, their basics and technical applications in Europe. The institute carries out research and development from idea to prototype. The topics focus on the needs of the market. At present, plasmas for materials and energy as well as for environment and health are the focus of interest.

Dörte Valenthin
Patent Officer

Tel.: +49(0) 3834 554 3909
Fax: +49(0) 3834 554 301

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System and method for treating surfaces of bodies, in particular for wound treatment

The invention relates to a system for treating surfaces of bodies, in particular a vacuum dressing, comprising at least one attachment means (5a) for fluidic attachment of a negative-pressure generator for generating a negative pressure in a volume that can be positioned at the surface of a body, and at least one means for plasma generation (8, 8a, 15) with which the volume in which the negative pressure can be generated can be at least partially filled with plasma or a plasma-activated medium. The device according to the invention is suitable in particular for combined negative-pressure and plasma therapy of a wound. The invention further relates to a method for treating surfaces of bodies by means of the system according to the invention, wherein a body with a surface to be treated is made available, the system for treating surfaces of bodies is made available, a negative pressure is generated in a volume positioned at the surface of the body, and the volume is at least partially filled with plasma or plasma-activated medium.

Figure 1 of the Patent Specification

Patent Info
FieldValue
Patent Family
Patent OfficePatent NumberFiledDate of PatentLegal Status
DEDE102017106482A127.03.2017expired
WOWO2017/167748A128.03.2017expired
EPEP3436102B128.03.201724.07.2024granted (in force in: unitary patent and NO, CH)
USUS2019/0110933A131.10.2018expired
Applicant(s)
Inventors
Device Info
FieldValue
Plasma Source Name
Plasma Source Application
Plasma Source Specification